P-nooca SiC Substrate Wafer

Sharaxaad Gaaban:

Semicera's P-nooca SiC Substrate Wafer waxaa loogu talagalay codsiyada elektiroonigga ah iyo kuwa indhaha ee sare. Wafers-yadani waxay bixiyaan hab-dhaqan aan caadi ahayn iyo degganaansho kulayl, taasoo ka dhigaysa mid ku habboon aaladaha waxqabadka sare leh. Semicera, filo saxnaanta iyo isku halaynta nooca P-ga ah ee SiC substrate wafers.


Faahfaahinta Alaabta

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Semicera's P-nooca SiC Substrate Wafer waa qayb muhiim ah oo loogu talagalay horumarinta aaladaha elegtarooniga ah ee horumarsan iyo optoelectronic. Wafersyadan waxaa si gaar ah loogu talagalay in lagu bixiyo waxqabadka la xoojiyay ee awood sare iyo jawi kuleyl sare leh, taageeraya baahida sii kordheysa ee qaybaha waxtarka iyo waarta.

Doping-ka nooca P ee waferradayada SiC waxay hubisaa hagaajinta korantada iyo dallaca dhaqdhaqaaqa sideyaasha. Tani waxay ka dhigaysaa inay si gaar ah ugu habboon yihiin codsiyada ku jira korantada elektiroonigga ah, LED-yada, iyo unugyada sawir-qaadista, halkaas oo lumitaanka awoodda hoose iyo waxtarka sare ay muhiim u yihiin.

Lagu soo saaray heerarka ugu sarreeya ee saxnaanta iyo tayada, Semicera's P-nooca SiC wafers waxay bixiyaan labbis heer sare ah oo dusha sare ah iyo heerarka cilladaha ugu yar. Astaamahani waxay muhiim u yihiin warshadaha halka joogtaynta iyo isku halaynta ay muhiim u yihiin, sida hawada hawada, baabuurta, iyo qaybaha tamarta la cusboonaysiin karo.

Ballanqaadka Semicera ee hal-abuurnimada iyo wacnaanta waxay ka caddahay nooca P-nooca SiC Substrate Wafer. Markaad dhexda geliso waferradan habka wax-soo-saarkaaga, waxaad hubisaa in aaladahaagu ay ka faa'iidaysanayaan kuleyliyaha gaarka ah iyo kuwa korantada ee SiC, taasoo awood u siinaysa inay si hufan ugu shaqeeyaan xaaladaha adag.

Maalgelinta Semicera's nooca P-nooca SiC Substrate Wafer macnaheedu waa xulashada badeecada isku daraysa sayniska shay-goynta iyo injineernimada xeeldheer. Semicera waxay u heellan tahay inay taageerto jiilka soo socda ee tignoolajiyada elektiroonigga ah iyo optoelectronic, iyadoo siinaya qaybaha muhiimka ah ee looga baahan yahay guushaada warshadaha semiconductor.

Walxaha

Wax soo saar

Cilmi baaris

nacasnimo

Qiyaasta Crystal

Noocyo badan

4H

Khaladka jihaynta dusha sare

<11-20>4±0.15°

Halbeegyada Korontada

Dopant

n-nooca Nitrogen

iska caabin

0.015-0.025ohm · cm

Halbeegyada Makaanikada

Dhexroorka

150.0 ± 0.2mm

Dhumucda

350± 25 μm

Hanuuninta fidsan ee aasaasiga ah

[1-100]±5°

Dhererka siman ee aasaasiga ah

47.5 ± 1.5mm

Dabaqa labaad

Midna

TTV

≤5 μm

≤10 μm

≤15 μm

LTV

≤3 μm (5mm*5mm)

≤5 μm (5mm*5mm)

≤10 μm (5mm*5mm)

Qaansada

-15μm ~ 15μm

-35μm ~ 35μm

-45μm ~ 45μm

Warp

≤35 μm

≤45 μm

≤55 μm

Wajiga hore (Si-wejiga) qallafsanaanta (AFM)

Ra≤0.2nm (5μm*5μm)

Qaab dhismeedka

Cufnaanta tuubbada yar

<1 ea/cm2

<10 ea/cm2

<15 ea/cm2

Wasakhda birta

≤5E10atom/cm2

NA

BPD

≤1500 ea/cm2

≤3000 ea/cm2

NA

TSD

≤500 ea/cm2

≤1000 ea/cm2

NA

Tayada hore

Hore

Si

Dhammaadka dusha sare

Si-wejiga CMP

Qaybaha

≤60ea/wafer (xajmiga≥0.3μm)

NA

xoqid

≤5ea/mm Dhererka isugeynta ≤ Dhexroorka

Dhererka isugeynta≤2* Dhexroor

NA

Diirka liimiga ah/gomayska/ wasakhowga/ dildilaaca/ wasakhowga

Midna

NA

Chips-ka-geeska/indents/jabka/taargada hex

Midna

Aagagga nooca badan

Midna

Aagga isugeynta≤20%

Aagga isugeynta≤30%

Calaamadaynta laysarka hore

Midna

Tayada dambe

Dhammaadka dhabarka

C-waji CMP

xoqid

≤5ea/mm, Dhererka isugeynta≤2* Dhexroor

NA

Cilladaha dhabarka (dhab-jeexyada geesaha)

Midna

Dhabar xumada

Ra≤0.2nm (5μm*5μm)

Calaamadaynta laser-ka dambe

1 mm (laga bilaabo cidhifka sare)

Cidhif

Cidhif

Chamfer

Baakadaha

Baakadaha

Epi-diyaar ah oo leh baakad vacuum ah

Baakadaha cajaladaha wafer-ka badan

* Xusuusin: "NA" macnaheedu waa codsi la'aan Waxyaabaha aan la sheegin waxay tixraaci karaan SEMI-STD.

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SiC wafers

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