Semicera's P-nooca SiC Substrate Wafer waa qayb muhiim ah oo loogu talagalay horumarinta aaladaha elegtarooniga ah ee horumarsan iyo optoelectronic. Wafersyadan waxaa si gaar ah loogu talagalay in lagu bixiyo waxqabadka la xoojiyay ee awood sare iyo jawi kuleyl sare leh, taageeraya baahida sii kordheysa ee qaybaha waxtarka iyo waarta.
Doping-ka nooca P ee waferradayada SiC waxay hubisaa hagaajinta korantada iyo dallaca dhaqdhaqaaqa sideyaasha. Tani waxay ka dhigaysaa inay si gaar ah ugu habboon yihiin codsiyada ku jira korantada elektiroonigga ah, LED-yada, iyo unugyada sawir-qaadista, halkaas oo lumitaanka awoodda hoose iyo waxtarka sare ay muhiim u yihiin.
Lagu soo saaray heerarka ugu sarreeya ee saxnaanta iyo tayada, Semicera's P-nooca SiC wafers waxay bixiyaan labbis heer sare ah oo dusha sare ah iyo heerarka cilladaha ugu yar. Astaamahani waxay muhiim u yihiin warshadaha halka joogtaynta iyo isku halaynta ay muhiim u yihiin, sida hawada hawada, baabuurta, iyo qaybaha tamarta la cusboonaysiin karo.
Ballanqaadka Semicera ee hal-abuurnimada iyo wacnaanta waxay ka caddahay nooca P-nooca SiC Substrate Wafer. Markaad dhexda geliso waferradan habka wax-soo-saarkaaga, waxaad hubisaa in aaladahaagu ay ka faa'iidaysanayaan kuleyliyaha gaarka ah iyo kuwa korantada ee SiC, taasoo awood u siinaysa inay si hufan ugu shaqeeyaan xaaladaha adag.
Maalgelinta Semicera's nooca P-nooca SiC Substrate Wafer macnaheedu waa xulashada badeecada isku daraysa sayniska shay-goynta iyo injineernimada xeeldheer. Semicera waxay u heellan tahay inay taageerto jiilka soo socda ee tignoolajiyada elektiroonigga ah iyo optoelectronic, iyadoo siinaya qaybaha muhiimka ah ee looga baahan yahay guushaada warshadaha semiconductor.
Walxaha | Wax soo saar | Cilmi baaris | nacasnimo |
Qiyaasta Crystal | |||
Noocyo badan | 4H | ||
Khaladka jihaynta dusha sare | <11-20>4±0.15° | ||
Halbeegyada Korontada | |||
Dopant | n-nooca Nitrogen | ||
iska caabin | 0.015-0.025ohm · cm | ||
Halbeegyada Makaanikada | |||
Dhexroorka | 150.0 ± 0.2mm | ||
Dhumucda | 350± 25 μm | ||
Hanuuninta fidsan ee aasaasiga ah | [1-100]±5° | ||
Dhererka siman ee aasaasiga ah | 47.5 ± 1.5mm | ||
Dabaqa labaad | Midna | ||
TTV | ≤5 μm | ≤10 μm | ≤15 μm |
LTV | ≤3 μm (5mm*5mm) | ≤5 μm (5mm*5mm) | ≤10 μm (5mm*5mm) |
Qaansada | -15μm ~ 15μm | -35μm ~ 35μm | -45μm ~ 45μm |
Warp | ≤35 μm | ≤45 μm | ≤55 μm |
Wajiga hore (Si-wejiga) qallafsanaanta (AFM) | Ra≤0.2nm (5μm*5μm) | ||
Qaab dhismeedka | |||
Cufnaanta tuubbada yar | <1 ea/cm2 | <10 ea/cm2 | <15 ea/cm2 |
Wasakhda birta | ≤5E10atom/cm2 | NA | |
BPD | ≤1500 ea/cm2 | ≤3000 ea/cm2 | NA |
TSD | ≤500 ea/cm2 | ≤1000 ea/cm2 | NA |
Tayada hore | |||
Hore | Si | ||
Dhammaadka dusha sare | Si-wejiga CMP | ||
Qaybaha | ≤60ea/wafer (xajmiga≥0.3μm) | NA | |
xoqid | ≤5ea/mm Dhererka isugeynta ≤ Dhexroorka | Dhererka isugeynta≤2* Dhexroor | NA |
Diirka liimiga ah/gomayska/ wasakhowga/ dildilaaca/ wasakhowga | Midna | NA | |
Chips-ka-geeska/indents/jabka/taargada hex | Midna | ||
Aagagga nooca badan | Midna | Aagga isugeynta≤20% | Aagga isugeynta≤30% |
Calaamadaynta laysarka hore | Midna | ||
Tayada dambe | |||
Dhammaadka dhabarka | C-waji CMP | ||
xoqid | ≤5ea/mm, Dhererka isugeynta≤2* Dhexroor | NA | |
Cilladaha dhabarka (dhab-jeexyada geesaha) | Midna | ||
Dhabar xumada | Ra≤0.2nm (5μm*5μm) | ||
Calaamadaynta laser-ka dambe | 1 mm (laga bilaabo cidhifka sare) | ||
Cidhif | |||
Cidhif | Chamfer | ||
Baakadaha | |||
Baakadaha | Epi-diyaar ah oo leh baakad vacuum ah Baakadaha cajaladaha wafer-ka badan | ||
* Xusuusin: "NA" macnaheedu waa codsi la'aan Waxyaabaha aan la sheegin waxay tixraaci karaan SEMI-STD. |