Substrate Ga2O3

Sharaxaad Gaaban:

Ga2O3Substrate- Ku fur fursadaha cusub ee korantada korantada iyo optoelectronics Semicera's Ga2O3Substrate, oo loogu talagalay waxqabadka gaarka ah ee codsiyada korantada sare iyo kuwa soo noqnoqonaya.


Faahfaahinta Alaabta

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Semicera wuxuu ku faanaa inuu soo bandhigoGa2O3Substrate, walxo heersare ah oo diyaar u ah inay wax ka beddelaan korantada elektiroonigga ah iyo optoelectronics.Gallium oxide (Ga2O3) substrateswaxaa lagu yaqaanaa garaafkooda aadka u ballaaran, taasoo ka dhigaysa inay ku habboon yihiin aaladaha awoodda sare iyo kuwa soo noqnoqonaya.

 

Astaamaha Muhiimka ah:

Bandgap aadka u ballaadhan: Ga2O3 waxay bixisaa bandgap ah qiyaastii 4.8 eV, taasoo si weyn kor ugu qaadaysa awoodda ay u leedahay inay xakamayso tamarta sare iyo heerkulka marka la barbar dhigo agab dhaqameed sida Silicon iyo GaN.

Korantada Burburka Sare: Iyada oo leh goob burbursan oo gaar ah,Ga2O3Substratewaxay ku fiican tahay aaladaha u baahan hawlgalka korantada sare, hubinta waxtarka weyn iyo isku halaynta.

• Xasiloonida kulaylka: Xasiloonida kulaylka ee agabka ayaa ka dhigaysa mid ku habboon codsiyada deegaan aad u daran, iyada oo la ilaalinayo waxqabadka xitaa marka lagu jiro xaalado adag.

Codsiyada la taaban karo: Ku habboon in lagu isticmaalo transistor-ka awoodda waxtarka sare leh, aaladaha UV optoelectronic, iyo in ka badan, oo siinaya aasaas adag nidaamyada korantada ee horumarsan.

 

Khibrad u yeelo mustaqbalka tignoolajiyada semiconductor-ka Semicera'sGa2O3Substrate. Naqshadeynta si loo daboolo baahida sii kordheysa ee korantada awoodda sare iyo soo noqnoqoshada sare leh, substrate-kan ayaa dejinaya heer cusub oo waxqabad iyo adkeysi. Aamin Semicera si ay u keento xalal cusub oo loogu talagalay codsiyadaada ugu adag.

Walxaha

Wax soo saar

Cilmi baaris

nacasnimo

Qiyaasta Crystal

Noocyo badan

4H

Khaladka jihaynta dusha sare

<11-20>4±0.15°

Qiyaasta Korontada

Dopant

n-nooca Nitrogen

iska caabin

0.015-0.025ohm · cm

Halbeegyada Makaanikada

Dhexroorka

150.0 ± 0.2mm

Dhumucda

350± 25 μm

Hanuuninta fidsan ee aasaasiga ah

[1-100]±5°

Dhererka siman ee aasaasiga ah

47.5 ± 1.5mm

Dabaqa labaad

Midna

TTV

≤5 μm

≤10 μm

≤15 μm

LTV

≤3 μm (5mm*5mm)

≤5 μm (5mm*5mm)

≤10 μm (5mm*5mm)

Qaansada

-15μm ~ 15μm

-35μm ~ 35μm

-45μm ~ 45μm

Warp

≤35 μm

≤45 μm

≤55 μm

Wajiga hore (Si-wejiga) qallafsanaanta (AFM)

Ra≤0.2nm (5μm*5μm)

Qaab dhismeedka

Cufnaanta tuubbada yar

<1 ea/cm2

<10 ea/cm2

<15 ea/cm2

Wasakhda birta

≤5E10atom/cm2

NA

BPD

≤1500 ea/cm2

≤3000 ea/cm2

NA

TSD

≤500 ea/cm2

≤1000 ea/cm2

NA

Tayada hore

Hore

Si

Dhammaadka dusha sare

Si-wejiga CMP

Qaybaha

≤60ea/wafer (xajmiga≥0.3μm)

NA

xoqid

≤5ea/mm Dhererka isugeynta ≤ Dhexroorka

Dhererka isugeynta≤2* Dhexroor

NA

Diirka liimiga ah/gomayska/ wasakhowga/ dildilaaca/ wasakhowga

Midna

NA

Chips-ka-geeska/indents/jabka/taargada hex

Midna

Aagagga nooca badan

Midna

Aagga isugeynta≤20%

Aagga isugeynta≤30%

Calaamadaynta laysarka hore

Midna

Tayada dambe

Dhammaadka dhabarka

C-waji CMP

xoqid

≤5ea/mm, Dhererka isugeynta≤2* Dhexroor

NA

Cilladaha dhabarka (dhab-jeexyada geesaha)

Midna

Dhabar xumada

Ra≤0.2nm (5μm*5μm)

Calaamadaynta laser-ka dambe

1 mm (laga bilaabo cidhifka sare)

Cidhif

Cidhif

Chamfer

Baakadaha

Baakadaha

Epi-diyaar ah oo leh baakad vacuum ah

Baakadaha cajaladaha wafer-ka badan

* Xusuusin: "NA" macnaheedu waa codsi la'aan Waxyaabaha aan la sheegin waxay tixraaci karaan SEMI-STD.

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SiC wafers

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