850V Awood Sare GaN-on-Si Epi Wafer

Sharaxaad Gaaban:

850V Awood Sare GaN-on-Si Epi Wafer- Soo hel jiilka soo socda ee tignoolajiyada semiconductor leh Semicera's 850V High Power GaN-on-Si Epi Wafer, oo loogu talagalay waxqabadka sare iyo hufnaanta codsiyada korantada sare.


Faahfaahinta Alaabta

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Semicerasoo bandhigaya850V Awood Sare GaN-on-Si Epi Wafer, horumar laga gaaray hal-abuurka semiconductor. Waferkan sare ee epi wafer wuxuu isku daraa waxtarka sare ee Gallium Nitride (GaN) oo leh kharashka-waxtarka Silicon (Si), abuurista xal xoog leh oo loogu talagalay codsiyada korantada sare.

Astaamaha Muhiimka ah:

Xakamaynta Voltage Sare: Injineer si uu u taageero ilaa 850V, GaN-on-Si Epi Wafer-kan ayaa ku habboon baahida elektiroonigga ah, awood u siinaysa hufnaan sare iyo waxqabad.

Cufnaanta Awoodeed ee La xoojiyey: Dhaqdhaqaaqa elektaroonigga ah ee sarreeya iyo kuleylka kuleylka, tignoolajiyada GaN waxay u oggolaaneysaa naqshado isku dhafan iyo kororka cufnaanta awoodda.

Xalka Qiimaha-Wanagsan: Adigoo ka faa'iidaysanaya silikoon sida substrate-ka, waferkan epi wuxuu bixiyaa beddelka kharash-ool ah oo beddelka wafer-dhaqameedka GaN, iyada oo aan waxyeello loo geysan tayada ama waxqabadka.

Kala Duwan Codsiga BalaadhanKu fiican in loo isticmaalo beddelayaasha korantada, amplifiers RF, iyo aaladaha kale ee tamarta sare leh, hubinta isku halaynta iyo cimri dhererka

Ku baadh mustaqbalka tignoolajiyada korantada sare leh ee Semicera's850V Awood Sare GaN-on-Si Epi Wafer. Loogu talagalay codsiyada cidhiidhiga ah, alaabtan ayaa hubinaysa in qalabkaaga elegtarooniga ah ay ku shaqeeyaan waxtarka iyo kalsoonida ugu badan. U dooro Semicera baahiyahaaga jiilka soo socda.

Walxaha

Wax soo saar

Cilmi baaris

nacasnimo

Qiyaasta Crystal

Noocyo badan

4H

Khaladka jihaynta dusha sare

<11-20>4±0.15°

Halbeegyada Korontada

Dopant

n-nooca Nitrogen

iska caabin

0.015-0.025ohm · cm

Halbeegyada Makaanikada

Dhexroorka

150.0 ± 0.2mm

Dhumucda

350± 25 μm

Hanuuninta fidsan ee aasaasiga ah

[1-100]±5°

Dhererka siman ee aasaasiga ah

47.5 ± 1.5mm

Dabaqa labaad

Midna

TTV

≤5 μm

≤10 μm

≤15 μm

LTV

≤3 μm (5mm*5mm)

≤5 μm (5mm*5mm)

≤10 μm (5mm*5mm)

Qaansada

-15μm ~ 15μm

-35μm ~ 35μm

-45μm ~ 45μm

Warp

≤35 μm

≤45 μm

≤55 μm

Wajiga hore (Si-wejiga) qallafsanaanta (AFM)

Ra≤0.2nm (5μm*5μm)

Qaab dhismeedka

Cufnaanta tuubbada yar

<1 ea/cm2

<10 ea/cm2

<15 ea/cm2

Wasakhda birta

≤5E10atom/cm2

NA

BPD

≤1500 ea/cm2

≤3000 ea/cm2

NA

TSD

≤500 ea/cm2

≤1000 ea/cm2

NA

Tayada hore

Hore

Si

Dhammaadka dusha sare

Si-wejiga CMP

Qaybaha

≤60ea/wafer (xajmiga≥0.3μm)

NA

xoqid

≤5ea/mm Dhererka isugeynta ≤ Dhexroorka

Dhererka isugeynta≤2* Dhexroor

NA

Diirka liimiga ah/gomayska/ wasakhowga/ dildilaaca/ wasakhowga

Midna

NA

Chips-ka-geeska/indents/jabka/taargada hex

Midna

Aagagga nooca badan

Midna

Aagga isugeynta≤20%

Aagga isugeynta≤30%

Calaamadaynta laysarka hore

Midna

Tayada dambe

Dhammaadka dhabarka

C-waji CMP

xoqid

≤5ea/mm, Dhererka isugeynta≤2* Dhexroor

NA

Cilladaha dhabarka (dhab-jeexyada geesaha)

Midna

Dhabar xumada

Ra≤0.2nm (5μm*5μm)

Calaamadaynta laser-ka dambe

1 mm (laga bilaabo cidhifka sare)

Cidhif

Cidhif

Chamfer

Baakadaha

Baakadaha

Epi-diyaar ah oo leh baakad vacuum ah

Baakadaha cajaladaha wafer-ka badan

* Xusuusin: "NA" macnaheedu waa codsi la'aan Waxyaabaha aan la sheegin waxay tixraaci karaan SEMI-STD.

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SiC wafers

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