6 inch N-nooca SiC Wafer

Sharaxaad Gaaban:

Semicera's 6 Inch N-nooca SiC Wafer wuxuu bixiyaa kuleyl heer sare ah iyo xoog koronto oo sarreeya, taasoo ka dhigaysa doorasho heer sare ah oo loogu talagalay qalabka korontada iyo RF. Waferkan, oo loogu talagalay in lagu daboolo baahiyaha warshadaha, ayaa tusaale u ah ka go'naanta Semicera ee tayada iyo cusboonaysiinta agabka semiconductor.


Faahfaahinta Alaabta

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Semicera's 6 Inch N-nooca SiC Wafer wuxuu u taagan yahay safka hore ee tignoolajiyada semiconductor. Loogu sameeyay waxqabadka ugu wanaagsan, waferkan waxa uu ka sarreeyaa awood sare, soo noqnoqoshada sare, iyo codsiyada kulaylka sare, ee lagama maarmaanka u ah aaladaha elegtarooniga ah ee horumarsan.

Waferkayaga 6 inch N-nooca SiC waxa uu leeyahay dhaq-dhaqaaq elektaroonik ah oo sarreeya iyo iska caabin hooseeya, kuwaas oo ah halbeegyada muhiimka ah ee aaladaha korantada sida MOSFETs, diodes, iyo qaybo kale. Guryahaani waxay xaqiijinayaan beddelka tamarta hufan iyo hoos u dhigidda soo saarista kulaylka, kor u qaadista waxqabadka iyo cimriga hababka elektaroonigga ah.

Nidaamyada xakamaynta tayada adag ee Semicera waxay xaqiijiyaan in wafer kasta oo SiC ah uu ilaaliyo fidsanaanta dusha sare iyo cilladaha ugu yar. Fiiro gaar ah u leh tafatirka ayaa hubinaysa in waferradayadu ay buuxiyaan shuruudaha adag ee warshadaha sida baabuurta, hawada hawada, iyo isgaarsiinta.

Marka lagu daro sifooyinkeeda koronto ee sare, nooca N-nooca SiC wafer wuxuu bixiyaa degenaansho kulayl adag iyo iska caabin heerkul sare ah, taasoo ka dhigaysa mid ku habboon bay'ada laga yaabo inay alaabta caadiga ahi ku fashilmaan. Awooddani waxay si gaar ah qiimo ugu leedahay codsiyada ku lug leh hawlgallada soo noqnoqda sare iyo kuwa awoodda sare leh.

Markaad dooranayso Semicera's 6 Inch N-nooca SiC Wafer, waxaad maalgashanaysaa badeecad matalaysa meesha ugu sarreysa ee hal-abuurka semiconductor. Waxaa naga go'an inaan bixinno dhismooyinka qalabka casriga ah, hubinta in la-hawlgalayaashayada warshadaha kala duwan ay helaan agabka ugu wanaagsan ee horumarkooda teknoolojiyadda.

Walxaha

Wax soo saar

Cilmi baaris

nacasnimo

Qiyaasta Crystal

Noocyo badan

4H

Khaladka jihaynta dusha sare

<11-20>4±0.15°

Halbeegyada Korontada

Dopant

n-nooca Nitrogen

iska caabin

0.015-0.025ohm · cm

Halbeegyada Makaanikada

Dhexroorka

150.0 ± 0.2mm

Dhumucda

350± 25 μm

Hanuuninta fidsan ee aasaasiga ah

[1-100]±5°

Dhererka siman ee aasaasiga ah

47.5 ± 1.5mm

Dabaqa labaad

Midna

TTV

≤5 μm

≤10 μm

≤15 μm

LTV

≤3 μm (5mm*5mm)

≤5 μm (5mm*5mm)

≤10 μm (5mm*5mm)

Qaansada

-15μm ~ 15μm

-35μm ~ 35μm

-45μm ~ 45μm

Warp

≤35 μm

≤45 μm

≤55 μm

Wajiga hore (Si-wejiga) qallafsanaanta (AFM)

Ra≤0.2nm (5μm*5μm)

Qaab dhismeedka

Cufnaanta tuubbada yar

<1 ea/cm2

<10 ea/cm2

<15 ea/cm2

Wasakhda birta

≤5E10atom/cm2

NA

BPD

≤1500 ea/cm2

≤3000 ea/cm2

NA

TSD

≤500 ea/cm2

≤1000 ea/cm2

NA

Tayada hore

Hore

Si

Dhammaadka dusha sare

Si-wejiga CMP

Qaybaha

≤60ea/wafer (xajmiga≥0.3μm)

NA

xoqid

≤5ea/mm Dhererka isugeynta ≤ Dhexroorka

Dhererka isugeynta≤2* Dhexroor

NA

Diirka liimiga ah/gomayska/ wasakhowga/ dildilaaca/ wasakhowga

Midna

NA

Chips-ka-geeska/indents/jabka/taargada hex

Midna

Aagagga nooca badan

Midna

Aagga isugeynta≤20%

Aagga isugeynta≤30%

Calaamadaynta laysarka hore

Midna

Tayada dambe

Dhammaadka dhabarka

C-waji CMP

xoqid

≤5ea/mm, Dhererka isugeynta≤2* Dhexroor

NA

Cilladaha dhabarka (dhab-jeexyada geesaha)

Midna

Dhabar xumada

Ra≤0.2nm (5μm*5μm)

Calaamadaynta laser-ka dambe

1 mm (laga bilaabo cidhifka sare)

Cidhif

Cidhif

Chamfer

Baakadaha

Baakadaha

Epi-diyaar ah oo leh baakad vacuum ah

Baakadaha cajaladaha wafer-ka badan

* Xusuusin: "NA" macnaheedu waa codsi la'aan Waxyaabaha aan la sheegin waxay tixraaci karaan SEMI-STD.

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SiC wafers

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