4 inch Substrate N-nooca SiC Substrate

Sharaxaad Gaaban:

Semicera waxa ay bixisaa tiro balaadhan oo ah 4H-8H SiC wafers. Sannado badan, waxaan ahayn soo saaraha iyo alaab-qeybiyaha alaabta semiconductor iyo warshadaha sawir-qaadista. Alaabadayada ugu muhiimsan waxaa ka mid ah: Silicon carbide etch taarikada, gawaarida silikoon carbide doonta, doonyaha wafer silicon carbide (PV & Semiconductor), tuubooyinka foornada silikoon carbide, paddles silicon carbide cantilever paddles, silicon carbide chucks silicon carbide alwaaxdii, iyo sidoo kale CVD SiC daahan Dahaarka TaC Oo daboolaya badi suuqyada Yurub iyo Ameerika. Waxaan rajeyneynaa inaan noqono lammaanahaaga muddada-dheer ee Shiinaha.

 

Faahfaahinta Alaabta

Tags Product

tech_1_2_cabbir

Silicon carbide (SiC) walxo crystal ah oo kali ah ayaa leh ballac ballaaran oo faaruq ah (~ Si 3 jeer), korantada kuleylka sare (~ Si 3.3 jeer ama GaAs 10 jeer), heerka guuritaanka korantada elektaroonigga sare (~ Si 2.5 jeer), koronto jaban oo sarreeya garoonka (~ Si 10 jeer ama GaAs 5 jeer) iyo astaamo kale oo muuqda.

Tamarta Semicera waxay siin kartaa macaamiisha tayada wax-qabad ee tayada sare leh (Conductive), Semi-insulating (Semi-insulating), HPSI (High Purity semi-insulating) substrate silicon carbide; Intaa waxaa dheer, waxaan ku siin karnaa macaamiisha silikoon carbide xaashida epitaxial isku mid ah oo isku mid ah; Waxaan sidoo kale u habeyn karnaa xaashida epitaxial iyadoo loo eegayo baahiyaha gaarka ah ee macaamiisha, mana jirto wax dalab ah oo ugu yar.

Walxaha

Wax soo saar

Cilmi baaris

nacasnimo

Qiyaasta Crystal

Noocyo badan

4H

Khaladka jihaynta dusha sare

<11-20>4±0.15°

Halbeegyada Korontada

Dopant

n-nooca Nitrogen

iska caabin

0.015-0.025ohm · cm

Halbeegyada Makaanikada

Dhexroorka

99.5 - 100mm

Dhumucda

350± 25 μm

Hanuuninta fidsan ee aasaasiga ah

[1-100]±5°

Dhererka siman ee aasaasiga ah

32.5 ± 1.5mm

Booska fidsan ee labaad

90° CW dabaqa hoose ±5°. silikon kor u kaca

Dhererka siman ee labaad

18± 1.5mm

TTV

≤5 μm

≤10 μm

≤20 μm

LTV

≤2 μm (5mm*5mm)

≤5 μm (5mm*5mm)

NA

Qaansada

-15μm ~ 15μm

-35μm ~ 35μm

-45μm ~ 45μm

Warp

≤20 μm

≤45 μm

≤50 μm

Wajiga hore (Si-wejiga) qallafsanaanta (AFM)

Ra≤0.2nm (5μm*5μm)

Qaab dhismeedka

Cufnaanta tuubbada yar

≤1 ea/cm2

≤5 ea/cm2

≤10 ea/cm2

Wasakhda birta

≤5E10atom/cm2

NA

BPD

≤1500 ea/cm2

≤3000 ea/cm2

NA

TSD

≤500 ea/cm2

≤1000 ea/cm2

NA

Tayada hore

Hore

Si

Dhammaadka dusha sare

Si-wejiga CMP

Qaybaha

≤60ea/wafer (xajmiga≥0.3μm)

NA

xoqid

≤2ea/mm Dhererka isugeynta ≤ Dhexroorka

Dhererka isugeynta≤2* Dhexroor

NA

Diirka liimiga ah/gomayska/ wasakhowga/ dildilaaca/ wasakhowga

Midna

NA

Chips-ka-geeska/indents/jabka/taargada hex

Midna

NA

Aagagga nooca badan

Midna

Aagga isugeynta≤20%

Aagga isugeynta≤30%

Calaamadaynta laysarka hore

Midna

Tayada dambe

Dhammaadka dhabarka

C-waji CMP

xoqid

≤5ea/mm, Dhererka isugeynta≤2* Dhexroor

NA

Cilladaha dhabarka (dhab-jeexyada geesaha)

Midna

Dhabar xumada

Ra≤0.2nm (5μm*5μm)

Calaamadaynta laser-ka dambe

1 mm (laga bilaabo cidhifka sare)

Cidhif

Cidhif

Chamfer

Baakadaha

Baakadaha

Bacda gudaha waxaa ka buuxa nitrogen, bacda dibaddana waa la faaruqiyay.

Cajalad wafer-badan, diyaar u ah.

* Xusuusin: "NA" macnaheedu waa codsi la'aan Waxyaabaha aan la sheegin waxay tixraaci karaan SEMI-STD.

SiC wafers

Goobta shaqada ee Semicera Goobta shaqada ee Semicera 2 Mashiinka qalabka Habaynta CNN, nadiifinta kiimikada, daahan CVD Adeegeena


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