4 inch N-nooca SiC Substrate

Sharaxaad Gaaban:

Semicera's 4 Inch N-nooca SiC Substrates waxaa si taxadar leh loogu talagalay waxqabadka korantada iyo kulaylka sare ee qalabka korantada iyo codsiyada soo noqnoqda sare. Substrates-yadani waxay bixiyaan firfircooni iyo xasilooni aad u fiican, taas oo ka dhigaysa mid ku habboon aaladaha jiilka xiga. Ku kalsoonow Semicera saxnaanta iyo tayada agabka horumarsan.


Faahfaahinta Alaabta

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Semicera's 4 Inch N-nooca SiC Substrates waxaa loo sameeyay si ay ula kulmaan heerarka saxda ah ee warshadaha semiconductor. Substrates-yadani waxay bixiyaan aasaas waxqabad sare leh oo loogu talagalay codsiyo badan oo elektaroonig ah, oo bixiya dabeecad aan caadi ahayn iyo guryaha kulaylka.

N-nooca doping-ka ee substrate-yadan SiC waxay wanaajisaa dhaqdhaqaaqa korantada, taasoo ka dhigaysa inay si gaar ah ugu habboon yihiin codsiyada tamarta sare iyo kuwa soo noqnoqda. Gurigani wuxuu u oggolaanayaa in si hufan loogu shaqeeyo aaladaha sida diodes, transistors, iyo amplifiers, halkaas oo la yareeyo khasaaraha tamarta ay muhiim u tahay.

Semicera waxay isticmaashaa hababka wax soo saarka ee casriga ah si loo hubiyo in substrate kasta uu muujiyo tayada sare ee tayada sare leh iyo labbiska. Saxnimadani waxay muhiim u tahay codsiyada korantada elektiroonigga ah, aaladaha microwave-ka, iyo teknoolojiyadda kale ee u baahan waxqabad la isku halayn karo marka ay jiraan xaalado aad u daran.

Ku darista substrates-ka nooca SiC ee Semicera ee khadkaaga wax soo saarka macnaheedu waa ka faa'iidaysiga agabka bixiya kulaylka sareeyo iyo xasiloonida korantada. Substrate-yadani waxay ku habboon yihiin abuurista qaybo u baahan adkaysi iyo hufnaan, sida nidaamyada beddelka awoodda iyo cod-weyneyaasha RF.

Adigoo dooranaya Semicera's 4 Inch N-nooca SiC Substrates, waxaad maalgashanaysaa badeecad isku daraysa sayniska agabka cusub iyo farsamada farsamada. Semicera waxay sii wadaa hogaaminta warshadaha iyadoo siinaya xalal taageeraya horumarinta tignoolajiyada semiconductor-ka-goynta, hubinta waxqabadka sare iyo kalsoonida.

Walxaha

Wax soo saar

Cilmi baaris

nacasnimo

Qiyaasta Crystal

Noocyo badan

4H

Khaladka jihaynta dusha sare

<11-20>4±0.15°

Halbeegyada Korontada

Dopant

n-nooca Nitrogen

iska caabin

0.015-0.025ohm · cm

Halbeegyada Makaanikada

Dhexroorka

150.0 ± 0.2mm

Dhumucda

350± 25 μm

Hanuuninta fidsan ee aasaasiga ah

[1-100]±5°

Dhererka siman ee aasaasiga ah

47.5 ± 1.5mm

Dabaqa labaad

Midna

TTV

≤5 μm

≤10 μm

≤15 μm

LTV

≤3 μm (5mm*5mm)

≤5 μm (5mm*5mm)

≤10 μm (5mm*5mm)

Qaansada

-15μm ~ 15μm

-35μm ~ 35μm

-45μm ~ 45μm

Warp

≤35 μm

≤45 μm

≤55 μm

Wajiga hore (Si-wejiga) qallafsanaanta (AFM)

Ra≤0.2nm (5μm*5μm)

Qaab dhismeedka

Cufnaanta tuubbada yar

<1 ea/cm2

<10 ea/cm2

<15 ea/cm2

Wasakhda birta

≤5E10atom/cm2

NA

BPD

≤1500 ea/cm2

≤3000 ea/cm2

NA

TSD

≤500 ea/cm2

≤1000 ea/cm2

NA

Tayada hore

Hore

Si

Dhammaadka dusha sare

Si-wejiga CMP

Qaybaha

≤60ea/wafer (xajmiga≥0.3μm)

NA

xoqid

≤5ea/mm Dhererka isugeynta ≤ Dhexroorka

Dhererka isugeynta≤2* Dhexroor

NA

Diirka liimiga ah/gomayska/ wasakhowga/ dildilaaca/ wasakhowga

Midna

NA

Chips-ka-geeska/indents/jabka/taargada hex

Midna

Aagagga nooca badan

Midna

Aagga isugeynta≤20%

Aagga isugeynta≤30%

Calaamadaynta laysarka hore

Midna

Tayada dambe

Dhammaadka dhabarka

C-waji CMP

xoqid

≤5ea/mm, Dhererka isugeynta≤2* Dhexroor

NA

Cilladaha dhabarka (dhab-jeexyada geesaha)

Midna

Dhabar xumada

Ra≤0.2nm (5μm*5μm)

Calaamadaynta laser-ka dambe

1 mm (laga bilaabo cidhifka sare)

Cidhif

Cidhif

Chamfer

Baakadaha

Baakadaha

Epi-diyaar ah oo leh baakad vacuum ah

Baakadaha cajaladaha wafer-ka badan

* Xusuusin: "NA" macnaheedu waa codsi la'aan Waxyaabaha aan la sheegin waxay tixraaci karaan SEMI-STD.

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SiC wafers

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