30mm Aluminium Nitride Wafer Substrate

Sharaxaad Gaaban:

30mm Aluminium Nitride Wafer Substrate- Kor u qaad waxqabadka elektiroonigga ah iyo aaladaha optoelectronic leh Semicera's 30mm Aluminium Nitride Wafer Substrate, oo loogu talagalay kuleyliyaha gaarka ah iyo dahaarka sare ee korantada.


Faahfaahinta Alaabta

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Semiceraayaa ku hanweyn inay soo bandhigto30mm Aluminium Nitride Wafer Substrate, Qalab heer sare ah oo loo habeeyey si loo daboolo baahiyaha adag ee codsiyada elektarooniga ah iyo kuwa indhaha ee casriga ah. Aluminium Nitride (AlN) substrates waxay caan ku yihiin kuleylkooda heer sare ah iyo guryaha dahaarka korantada, iyaga oo ka dhigaya doorasho ku habboon aaladaha waxqabadka sare leh.

 

Astaamaha Muhiimka ah:

• Habdhaqanka kulaylka ee aan caadiga ahayn: The30mm Aluminium Nitride Wafer SubstrateWaxay ku faantaa kuleyl kuleyl ah ilaa 170 W/mK, si aad ah uga sarreeya qalabka kale ee substrate-ka ah, hubinta kala daadinta kulaylka hufan ee codsiyada awooda sare leh.

Dahaarka Sare ee Korontada: Iyada oo leh sifooyin koronto oo heer sare ah, substrate-kani wuxuu yareynayaa isdhaafsiga hadalka iyo faragelinta calaamadaha, taasoo ka dhigaysa mid ku habboon codsiyada RF iyo microwave.

Xoogga Makaanikada: The30mm Aluminium Nitride Wafer Substratewaxay bixisaa awood farsamo oo heer sare ah iyo xasilooni, hubinta adkeysiga iyo isku halaynta xitaa marka lagu jiro xaalado adag oo hawlgal ah.

Codsiyada kala duwan: Substrate-kani wuxuu ku fiican yahay isticmaalka LED-yada awoodda sare leh, diodes laser, iyo qaybaha RF, oo siinaya aasaas adag oo la isku halleyn karo mashaariicdaada ugu baahida badan.

Qalabaynta Saxda ahSemicera waxay xaqiijisaa in substrate-ka wafer kasta lagu farsameeyay saxsanaanta ugu saraysa, isagoo bixinaya dhumuc isku mid ah iyo tayada dusha sare si loo buuxiyo heerarka saxda ah ee qalabka elegtarooniga ah ee horumarsan.

 

Kordhi waxtarka iyo isku halaynta aaladahaaga Semicera's30mm Aluminium Nitride Wafer Substrate. Substrate-yadayada waxa loo qaabeeyey in ay keenaan waxqabad heersare ah, iyada oo la hubinayo in hababka elektaroonigga ah iyo kuwa indhaha elektiroonigga ah ay u shaqeeyaan sida ugu wanaagsan. Ku kalsoonow Semicera agabka goynta u horseeda warshadaha tayada iyo hal-abuurka.

Walxaha

Wax soo saar

Cilmi baaris

nacasnimo

Qiyaasta Crystal

Noocyo badan

4H

Khaladka jihaynta dusha sare

<11-20>4±0.15°

Halbeegyada Korontada

Dopant

n-nooca Nitrogen

iska caabin

0.015-0.025ohm · cm

Halbeegyada Makaanikada

Dhexroorka

150.0 ± 0.2mm

Dhumucda

350± 25 μm

Hanuuninta fidsan ee aasaasiga ah

[1-100]±5°

Dhererka siman ee aasaasiga ah

47.5 ± 1.5mm

Dabaqa labaad

Midna

TTV

≤5 μm

≤10 μm

≤15 μm

LTV

≤3 μm (5mm*5mm)

≤5 μm (5mm*5mm)

≤10 μm (5mm*5mm)

Qaansada

-15μm ~ 15μm

-35μm ~ 35μm

-45μm ~ 45μm

Warp

≤35 μm

≤45 μm

≤55 μm

Wajiga hore (Si-wejiga) qallafsanaanta (AFM)

Ra≤0.2nm (5μm*5μm)

Qaab dhismeedka

Cufnaanta tuubbada yar

<1 ea/cm2

<10 ea/cm2

<15 ea/cm2

Wasakhda birta

≤5E10atom/cm2

NA

BPD

≤1500 ea/cm2

≤3000 ea/cm2

NA

TSD

≤500 ea/cm2

≤1000 ea/cm2

NA

Tayada hore

Hore

Si

Dhammaadka dusha sare

Si-wejiga CMP

Qaybaha

≤60ea/wafer (xajmiga≥0.3μm)

NA

xoqid

≤5ea/mm Dhererka isugeynta ≤ Dhexroorka

Dhererka isugeynta≤2* Dhexroor

NA

Diirka liimiga ah/gomayska/ wasakhowga/ dildilaaca/ wasakhowga

Midna

NA

Chips-ka-geeska/indents/jabka/taargada hex

Midna

Aagagga nooca badan

Midna

Aagga isugeynta≤20%

Aagga isugeynta≤30%

Calaamadaynta laysarka hore

Midna

Tayada dambe

Dhammaadka dhabarka

C-waji CMP

xoqid

≤5ea/mm, Dhererka isugeynta≤2* Dhexroor

NA

Cilladaha dhabarka (dhab-jeexyada geesaha)

Midna

Dhabar xumada

Ra≤0.2nm (5μm*5μm)

Calaamadaynta laser-ka dambe

1 mm (laga bilaabo cidhifka sare)

Cidhif

Cidhif

Chamfer

Baakadaha

Baakadaha

Epi-diyaar ah oo leh baakad vacuum ah

Baakadaha cajaladaha wafer-ka badan

* Xusuusin: "NA" macnaheedu waa codsi la'aan Waxyaabaha aan la sheegin waxay tixraaci karaan SEMI-STD.

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