2 ~ 6 inch 4° xagal ka baxsan P-nooca 4H-SiC substrate

Sharaxaad Gaaban:

4° xagal ka baxsan P-nooca 4H-SiC substrate‌ waa walxo semiconductor gaar ah, halkaas oo "4° xagal ka baxsan" loola jeedaa xagasha hanuuninta crystal ee wafer oo ah 4 digrii xagasha, iyo "P-nooca" waxaa loola jeedaa nooca conductivity ee semiconductor. Qalabkani wuxuu leeyahay codsiyo muhiim ah oo ku jira warshadaha semiconductor, gaar ahaan dhinacyada korantada korantada iyo qalabka elektarooniga ah ee sarreeya.


Faahfaahinta Alaabta

Tags Product

Semicera's 2 ~ 6 inch 4° xagal ka baxsan P-nooca 4H-SiC substrates ayaa loo habeeyey si ay u daboolaan baahiyaha sii kordhaya ee awooda wax qabadka sare leh iyo soosaarayaasha qalabka RF. Hanuuninta xagasha 4° ka baxsan waxay hubisaa kobaca epitaxial ee la hagaajiyay, taasoo ka dhigaysa substrate-ka aasaaska ugu fiican ee aaladaha kala duwan ee semiconductor, oo ay ku jiraan MOSFETs, IGBTs, iyo diodes.

Tani 2 ~ 6 inch 4 ° xagal ka baxsan P-nooca 4H-SiC substrate wuxuu leeyahay sifooyin walxo aad u wanaagsan, oo ay ku jiraan kuleylka kuleylka sare, waxqabadka korantada ee aad u fiican, iyo xasilloonida farsamada ee cajiibka ah. Hanuuninta xagasha ka baxsan waxay caawisaa yaraynta cufnaanta micropipe waxayna kor u qaadaa lakabyada epitaxial ee siman, taas oo muhiim u ah hagaajinta waxqabadka iyo isku halaynta qalabka semiconductor ee ugu dambeeya.

Semicera's 2 ~ 6 inch 4° xagal ka baxsan P-nooca 4H-SiC substrates ayaa lagu heli karaa dhexrooryo kala duwan, oo u dhexeeya 2 inji ilaa 6 inji, si loo buuxiyo shuruudaha wax soo saarka ee kala duwan. Substrate-yadayada si sax ah ayaa loo farsameeyay si ay u bixiyaan heerar doping isku mid ah iyo sifooyin dusha sare oo tayo sare leh, iyadoo la hubinayo in maraqa kasta uu buuxiyo qeexitaannada adag ee looga baahan yahay codsiyada sare ee elektiroonigga ah.

Ballanqaadka Semicera ee hal-abuurka iyo tayada waxay hubisaa in 2 ~ 6 inch 4° xagal ka baxsan P-nooca 4H-SiC substrates ay bixiyaan waxqabad joogto ah oo codsiyo badan oo kala duwan laga bilaabo korantada korontada ilaa aaladaha soo noqnoqda. Alaabtani waxay siisaa xal lagu kalsoonaan karo oo loogu talagalay jiilka soo socda ee tamarta waxtarka leh, semiconductors-waxqabad sare leh, taageeraya horumarka tignoolajiyada ee warshadaha sida baabuurta, isgaarsiinta, iyo tamarta la cusboonaysiin karo.

Heerarka cabbirka la xiriira

Cabbirka

2-inch

4-inji

Dhexroorka 50.8 mm±0.38 mm 100.0 mm+0/-0.5 mm
Habaynta dusha sare 4° dhanka <11-20>±0.5° 4° dhanka <11-20>±0.5°
Dhererka Guriga aasaasiga ah 16.0 mm ± 1.5mm 32.5mm ± 2mm
Dhererka Guriga Sare 8.0 mm ± 1.5mm 18.0 mm ± 2 mm
Hanuuninta Flat Primary Barbar socda <11-20>±5.0° Barbardhac <11-20>± 5.0c
Hanuuninta Guriga Sare 90°CW laga bilaabo ± 5.0° hoose, silikoon weji 90°CW laga bilaabo ± 5.0° hoose, silikoon weji
Dhamaystir dusha sare C-Waji: Polish indhaha, Si-Waji: CMP C-Waji:OpticalPolish, Si-Face: CMP
Wafer Edge Beveling Beveling
Qalafsanaanta dusha sare Si-Face Ra <0.2 nm Si-Face Ra <0.2nm
Dhumucda 350.0 ± 25.0um 350.0 ± 25.0um
Noocyo badan 4H 4H
Doping p-Nooca p-Nooca

Heerarka cabbirka la xiriira

Cabbirka

6-inch
Dhexroorka 150.0 mm+0/-0.2 mm
Hanuuninta dusha sare 4° dhanka <11-20>±0.5°
Dhererka Guriga aasaasiga ah 47.5 mm ± 1.5mm
Dhererka Guriga Sare Midna
Hanuuninta Flat Primary Barbar socda <11-20>±5.0°
Hanuuninta Flat Secondary 90°CW laga bilaabo ± 5.0 hoose, silikoon weji
Dhamaystir dusha sare C-Waji: Polish indhaha, Si-Face:CMP
Wafer Edge Beveling
Qalafsanaanta dusha sare Si-Face Ra <0.2 nm
Dhumucda 350.0± 25.0μm
Noocyo badan 4H
Doping p-Nooca

Ramaan

2-6 inch 4° xagal ka baxsan P-nooca 4H-SiC substrate-3

qalooca ruxaya

2-6 inch 4° xagal ka baxsan P-nooca 4H-SiC substrate-4

Cufnaanta kala-baxa (KOH etching)

2-6 inch 4° xagal ka baxsan P-nooca 4H-SiC substrate-5

KOH sawiro xajinaya

2-6 inch 4° xagal ka baxsan P-nooca 4H-SiC substrate-6
SiC wafers

  • Kii hore:
  • Xiga: